Ultra-High Vacuum Evaporation Equipment

It is used to evaporate various metal and oxide films of different thicknesses under high vacuum, and is widely used in physics, biology, chemistry, materials, electronics and other fields. The types of evaporated films include Au, Ti, Cr, Ag, Al, Cu, Fe, Ni, Ge, Pt, Pb, In, Mo, SiO₂ _,etc.

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Product Details

How it works

Under high vacuum, the electron gun filament is heated and emits thermal electrons, which are accelerated by the accelerating anode, gaining greater kinetic energy and bombarding the evaporation material, converting the kinetic energy into heat to heat and vaporize the evaporation material, thereby achieving evaporation coating.The electron beam evaporation source consists of a hot cathode that emits electrons, an electron accelerating electrode, and a coating material that serves as an anode.The energy of the electron beam evaporation source can be highly concentrated, so that the coating material reaches a local high temperature and evaporates. By adjusting the power of the electron beam, the evaporation rate of the coating material can be easily controlled, which is particularly beneficial for high melting point and high purity metals and compound materials.

Features

1) Film internal non-uniformity: ±3% (metal, 4 inches);

2) Non-uniformity between film sheets: ±4% (metal, 4 inches);

3) Ultimate vacuum: 6.66x10 ^-6Pa;

4) Mounting: Several samples of any size less than 4 inches.

Technical parameters:

Vacuum Chamber		U-shaped box with front door and exhaust system at the rear, size 500x500x600mm ²
Vacuum system configuration		Compound molecular pump, mechanical pump, gate valve
Ultimate pressure		≤6.67x10 ^-5Pa (after baking and degassing)
Restore vacuum time		45 minutes to reach 6.67x10 ^-4Pa (short exposure to the atmosphere and filling with dry nitrogen before starting to pump out)
Electron beam evaporation source	E-type electron gun	One set, anode voltage: 6kv, 8kv;
	Crucible	Water-cooled crucible, four-hole design, each with a capacity of 11ml
	power	0～6kW adjustable
Resistance evaporation source(Optional)	Power, voltage	Current 300A, maximum output power 3kW; 5, 10V
	quantity	1 set, switchable
	Water-cooled electrode	3 pieces, forming 2 evaporation boats
Workpiece holder type and size		Substrate size: can hold 4″ substrate; maximum heating temperature 800℃±1℃The substrate can rotate continuously at a speed of 5 to 60 rpm; the distance between the substrate and the evaporation source is adjustable from 300 to 350 mmManual control sample baffle assembly 1 set
Gas system		200SCCM mass flow controller 1 channel
Quartz crystal film thickness controller		Monitoring film thickness display range: 0～99μ9999A;
Equipment area	Host	900x800mm ²
	Electric control cabinet	800x800mm ²(two)