Tel.: 8615989623158
E-mail: sales@grandetop.com
Tel.: 8615989623158
E-mail: sales@grandetop.com
It can be used to prepare metal thin films, semiconductor thin films, oxide thin films, organic thin films, etc. It can be used by scientific research institutions to conduct research on new materials and new process thin films, and it can also be used for test work before mass production.
Equipment Composition
The equipment is mainly composed of organic/metal source evaporation deposition chamber, vacuum exhaust system, vacuum measurement system, evaporation source, sample heating and temperature control, electronic control system, gas distribution system and other parts.
Technical Parameters:
| Main vacuum chamber | Square vacuum chamber, size 400x400x400mm | |
| Vacuum system configuration | Molecular pump, mechanical pump, gate valve | |
| Ultimate pressure | ≤6.0x10-5 Pa | |
| Restore vacuum time | 9x10 -4 Pa can be reached in 40 minutes (after short exposure to the atmosphere and filling with dry nitrogen, the air is pumped out) | |
| Substrate heating stage | Sample size | 120x120mm, one piece |
| Exercise | The substrate can be raised and lowered, with a range of 0 to 50 mmThe substrate can rotate continuously at a speed of 5 to 30 rpm | |
| heating | Substrate heating maximum temperature 300 ℃Distance from substrate to evaporation source: 250-300mm | |
| Organic evaporation source | Crucible | Crucible capacity: ≥2cc |
| temperature | Room temperature ~ 500℃ , continuously adjustable | |
| power | Current 300A, maximum output power 3kW | |
| Water-cooled electrode | 4 pieces, forming 2 evaporation boats | |
| Quartz crystal film thickness controller | Detection film thickness display range: 0--99μ9999A | |
| Equipment area | Host | 2450×1250mm 2 (same size as glove box)Independent rack: 770x600 mm 2 , glove box: 1830x750mm 2 |
| Electric control cabinet | 700x700mm 2 (one) | |
