Tel.: 8615989623158
E-mail: sales@grandetop.com
Tel.: 8615989623158
E-mail: sales@grandetop.com
MF sputtering technique has become the mainstream technology of magnetron sputtering, what characteristics superior to the DC sputtering are: Overcome the phenomenon of anode disappearance. Reduce or eliminate the abnormal arc discharge of target, therefore, improve the stability of sputtering process technology, and increase the deposition rate of dielectric coating.
New developed plane target, cylindrical target, twin target, opposite target and various structures of MF sputtering targets. It is widely used in watchband, watchcases, mobile shell, hard wares, tableware etc. It can deposit all kinds of decorative coatings such as TiN, TiC, TiCN, TiAlN, CrN etc decorative coatings.
The Equipment offers coatings in various metal colors such as steel, nickel, gold, bronze, anthracite and black. The color of the coating is determined by its composition, which is composed of zirconium, titanium, nitrogen, carbon, oxygen and other metals. Our process engineering team can fine tune the color according to your requirements, so that you may be unique in your market.
PRODUCT ADVANTAGE.
Magnetron Sputtering Vacuum Coating Equipment includes the following key Features:
1, Effective: The deposition rate is fast
2, Compact: Small footprint, easy to integrate into the factory
3, Accurate: Accurate control of plating thickness
4, High quality: The film has high purity, good compactness and uniformity
5, Diversification: Mixed sputtering of different metals, alloys and oxides
6, Remote access: Provide factory remote diagnostics
Technical Parameters:
| Model | GMSV-1200 | GMSV-1600 | GMSV-1900 | GMSV-2100 |
| Size | Ф1200×H1200mm | Ф1600×H1200mm | Ф1900×H1200mm | Ф2100×H2100mm |
| Coating | Multi-function metal coating,composite membrane, transparent conductive coating, increase return to shoot coating, electromagnetic shielding coating, decorative coating, etc | |||
| Power supply | DC magnetron sputtering power supply,MF sputtering power supply,high pressure ion bombard power supply | |||
| Target | DC magnetic control target, medium frequency twin target, plane target and cylindrical target | |||
| Structure | Vertical signal door, vertical double doors | |||
| Pump system | Molecular pump (diffusion pump) + Roots pump + Mechanical pump+Holding pump (optional: turbo pump,poly cold system) | |||
| Air system | Mass flow controller(1-4road) | |||
| Ultimate Vacuum | 6×10﹣4 Pa（no-loading,clean chamber） | |||
| Pumping Time | No-loading from air to 5×10﹣3 Pa ＜13mins | |||
| Workpiece motion mode | 6 axis / 8axis/9axis public and self rotation/frequency conversion stepless speed regulation | |||
| Control mode | Manual+semi-automatic+Automatic integration/touch screen+PLC | |||
| Customized Service | Welcome to Non-standard and Special requirements,OEM/ODM orders.Customization of inner chamber size, temperature&humidity range,etc. | |||
| The technical information will be subjected to change without notice | ||||
